The precise control of feature sizes exhibits great importance in fabricating nanodevices for optoelectronics, plasmonics, meta-optics, and biosciences, just to name a few. Some applications require ...
ESOL has developed a standalone interference extreme ultraviolet (EUV) lithography tool for use in R&D applications. The system, called EMiLE (EUV Micro-interference Lithography Equipment), is primary ...
In the realm of science and technology, harnessing coherent light sources in the deep ultraviolet (DUV) region holds immense significance across various applications such as lithography, defect ...
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